Fundamentals of semiconductor fabrication / by Gary S. May, Simon M. Sze.
Material type:
TextPublication details: New Delhi : Wiley, c2004Description: xiii, 305 p. : ill. ; 26 cmISBN: 9788126532605 (pbk)Subject(s): Semiconductors -- Design and construction | Integrated circuits -- Design and constructionDDC classification: 621.3815
Contents:
CONTENTS
Chapter 1: Introduction
Chapter 2: Crystal growth
Chapter 3: Silicon oxide
Chapter 4: Photo Lithography
Chapter 5: Etching
Chapter 6: Diffusion
Chapter 7: Ion implantation
Chapter 8: Film deposition
Chapter 9: Process integration
Chapter 10: IC manufacturing
Chapter 11: Future trends and challenges
| Item type | Current library | Call number | Status | Date due | Barcode | Item holds |
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Namal Library Electrical Engineering | 621.3815 MAY-F 2011 3822 (Browse shelf (Opens below)) | Available | 0003822 |
Total holds: 0
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| 621.3815 MAR-D 2000 4336 Digital integrated circuit design | 621.3815 MAR-T 1972 10039 20 solid state projects for the home / | 621.3815 MAS-S 2010 4142 Semiconductor device modeling with SPICE / | 621.3815 MAY-F 2011 3822 Fundamentals of semiconductor fabrication / | 621.3815 MIL-M 2011 3031 Microelectronics / | 621.3815 MIL-M 2012 142 Millman's pulse, digital, and switching waveforms / | 621.3815 MIL-M 2012 3728 Millman's pulse, digital, and switching waveforms / |
Includes bibliographical references and index.
CONTENTS
Chapter 1: Introduction
Chapter 2: Crystal growth
Chapter 3: Silicon oxide
Chapter 4: Photo Lithography
Chapter 5: Etching
Chapter 6: Diffusion
Chapter 7: Ion implantation
Chapter 8: Film deposition
Chapter 9: Process integration
Chapter 10: IC manufacturing
Chapter 11: Future trends and challenges
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