| 000 | 01037cam a22002297a 4500 | ||
|---|---|---|---|
| 999 |
_c2637 _d2637 |
||
| 003 | OSt | ||
| 005 | 20200129063218.0 | ||
| 008 | 030811s2004 ii a g b 001 0 eng d | ||
| 020 | _a9788126532605 (pbk) | ||
| 040 | _cNCL | ||
| 082 | 0 | 0 |
_a621.3815 _bMAY-F 2011 3822 |
| 100 | 1 | _aMay, Gary S. | |
| 245 | 1 |
_aFundamentals of semiconductor fabrication / _cby Gary S. May, Simon M. Sze. |
|
| 260 |
_aNew Delhi : _bWiley, _cc2004. |
||
| 300 |
_axiii, 305 p. : _bill. ; _c26 cm. |
||
| 504 | _aIncludes bibliographical references and index. | ||
| 505 | _aCONTENTS Chapter 1: Introduction Chapter 2: Crystal growth Chapter 3: Silicon oxide Chapter 4: Photo Lithography Chapter 5: Etching Chapter 6: Diffusion Chapter 7: Ion implantation Chapter 8: Film deposition Chapter 9: Process integration Chapter 10: IC manufacturing Chapter 11: Future trends and challenges | ||
| 650 | 0 |
_aSemiconductors _xDesign and construction. |
|
| 650 | 0 |
_aIntegrated circuits _xDesign and construction. |
|
| 700 | 1 |
_aSze, S. M., _d1936- |
|
| 942 |
_2ddc _cBK |
||