VLSI fabrication principles : silicon and gallium arsenide / Sorab K. Ghandhi.
Material type: TextPublication details: New York : Wiley, c1994Edition: 2nd edDescription: xxiv, 834 p. : ill. ; 25 cmISBN: 9788126517909 (pbk)Subject(s): Integrated circuits -- Very large scale integration | Silicon | Gallium arsenideDDC classification: 621.3815
Contents:
CONTENTS
Chapter 1: Material Properties
Chapter 2: Phase diagrams and solid stability
Chapter 3: Crystal growth and doping
Chapter 4: Diffusion
Chapter 5: Epitaxy
Chapter 6: Ion Implantation
Chapter 7: Native Films
Chapter 8: Deposited films
Chapter 9: Etching and cleaning
Chapter 10: Lithographic process
Chapter 11: Device and Circuit fabrication
Item type | Current library | Call number | Status | Date due | Barcode | Item holds |
---|---|---|---|---|---|---|
Books | Namal Library Electrical Engineering | 621.3815 GHA-V 2013 3801 (Browse shelf (Opens below)) | Available | 0003801 |
Total holds: 0
Includes bibliographical references and index.
CONTENTS
Chapter 1: Material Properties
Chapter 2: Phase diagrams and solid stability
Chapter 3: Crystal growth and doping
Chapter 4: Diffusion
Chapter 5: Epitaxy
Chapter 6: Ion Implantation
Chapter 7: Native Films
Chapter 8: Deposited films
Chapter 9: Etching and cleaning
Chapter 10: Lithographic process
Chapter 11: Device and Circuit fabrication
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